Electron Beam Lithographer

Inactive
Notice ID:80GSFC21R0034

NASA/GSFC has a requirement for an electron beam lithography (EBL) system, used to define nano-sized geometric structures needed in the fabrication of advanced sensors, detectors, optical and micromac...

Department/Ind.Agency Subtier Office
NATIONAL AERONAUTICS AND SPACE ADMINISTRATION NATIONAL AERONAUTICS AND SPACE ADMINISTRATION NASA GODDARD SPACE FLIGHT CENTER
  PSC   SPECIALIZED SEMICONDUCTOR, MICROCIRCUIT, AND PRINTED CIRCUIT BOARD MANUFACTURING MACHINERY


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