Inductively Coupled Plasma System for Deep Reactive Ion Etching of Silicon Carbide

Inactive
Notice ID:80GRC021Q0013

This notice is a combined synopsis/solicitation for commercial items prepared in accordance with the format in FAR Subpart 12.6, as supplemented with additional information included in this notice. Th...

Department/Ind.Agency Subtier Office
NATIONAL AERONAUTICS AND SPACE ADMINISTRATION NATIONAL AERONAUTICS AND SPACE ADMINISTRATION NASA GLENN RESEARCH CENTER
  PSC   R&D- GENERAL SCIENCE/TECHNOLOGY: PHYSICAL SCIENCES (ADVANCED DEVELOPMENT)


Data sourced from SAM.gov. View Official Posting »

Inductively Coupled Plasma System for Deep Reactive Ion Etching of Silicon Carbide

Inactive
Notice ID:80GRC021Q0013

NASA Glenn Research Center (GRC) is hereby soliciting information from potential sources for Inductively Coupled Plasma System for Deep Reactive Ion Etching of Silicon Carbide. The National Aeronautic...

Department/Ind.Agency Subtier Office
NATIONAL AERONAUTICS AND SPACE ADMINISTRATION NATIONAL AERONAUTICS AND SPACE ADMINISTRATION NASA GLENN RESEARCH CENTER
  PSC   R&D- GENERAL SCIENCE/TECHNOLOGY: PHYSICAL SCIENCES (ADVANCED DEVELOPMENT)


Data sourced from SAM.gov. View Official Posting »