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TES-63 High Brightness Ion Source or equivalent A broadbeam ion implanter that is capable of at least 300µA current at implant energies covering the range 1V-15kV. We require the ability to change foc... TES-63 High Brightness Ion Source or equivalent A broadbeam ion implanter that is capable of at least 300µA current at implant energies covering the range 1V-15kV. We require the ability to change focus on the ion beam from 1mm-10mm beam diameter. Additionally, a charge neutralizer is desired to improve ion uptake in insulating materials, ideally in an energy range up to 1kV with 0.5mA electron current. The system must be compatible with existing vacuum system with available insertion depths of up to 30cm on a CF63 vacuum flange and 20cm insertion depth on a CF40 flange. Extraction method for ion accelerator must be based on technology that allows carbon containing molecules, such as RF driven Electron Cyclotron Resonance (ECR) sources. Filament based extraction is not acceptable.