This is a combined synopsis/solicitation for commercial items, and this announcement constitutes the only solicitation. It is a request for quotation (RFQ) for an atomic layer deposition (ALD) reactor capable of both thermal ALD and plasma-enhanced ALD (PE-ALD) modes. The reactor must enable uniform, conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates with high-aspect-ratio surface topographies. This acquisition is set aside for small business concerns and carries a Defense Priorities and Allocations System (DPAS) rating of DO-C9.