Inactive

The Naval Research Lab (NRL) is posting a Request for Information (RFI) and seeking potential sources for planning purposes only. This notice is not a formal Request for Proposal (RFP) or Request for ... The Naval Research Lab (NRL) is posting a Request for Information (RFI) and seeking potential sources for planning purposes only. This notice is not a formal Request for Proposal (RFP) or Request for Quote (RFQ). No awards will be made from the responses to this announcement. The Government will not reimburse any costs associated with the development and submission of materials in response to this request. There is no solicitation available at this time. However, should a requirement materialize, no basis for claims against NRL shall arise as a result of a response to this notice or NRL’s use of such information as either part of our evaluation process or in developing specifications for any subsequent requirement. Objective: The Naval Research Laboratory’s (NRL) Space Science Division is inquiring for potential sources that are capable of providing the below listed supplies, with the provided technical specifications. One (1) E-BEAM EVAPORATOR SYSTEM UHV Chamber: Main chamber vacuum must allow for pressure up to 10-8 torr range Must possess a Load-Lock Entry Chamber Angled Rotational Substrate Holder: Must possess a cooling capability with substrate rotation with a minimum angle rotation of 45 o. Also must allow film deposition on pre-processed vertical sidewalls of an ICL waveguide or LED mesa. Multi-Pocket UHV E-Beam Source: Typical metal deposition requires the combinations of Ti/Pt/Au for p-type contacts, Cr/Sn/Pt/Au for n-type contacts, or Ti/Ni/Ag as an etch mask. Since we also need to deposit Al2O3 and SiO2 films, with a minimum of 6 pockets are required in the target. Separate Valve for Target In-situ Crucible Exchange w/o Main Chamber Vacuum Break: Must be able to exchange the crucibles for target materials in situ without breaking the main chamber vacuum, in order to refill or supply additional target material. Must include Ion / Plasma Sources, Power Supplies / Controls End Point Detector: Requiring the precise milling control, with depth resolution to < 1mm. The system shall be equipped with an end-point detector and Ar+ plasma milling capability. Quartz Crystal Deposition Controller: System must be able to monitor the thickness of film deposition Internal Bakeout System: Capability to remove any residual water vapor in the vacuum chamber. Gas Handling: a) Mass Flow Controller (MFC) with Ar gas, b) MFC with O2 gas User Training: Contractor service engineer traveling to NRL site to commission and start-up the system and to provide 2 day of training to user personnel (total 3 days). Submission of Information: Interested parties should submit the following information to the below POC: Company Name, CAGE, DUNS, Size Status, and brief overview of ability to meet the above specification. All information and data received in response to this posting marked or designated as corporate or proprietary information will be protected as such. Please include this notice number on all documents and email correspondence. Classified Material shall not be submitted. Please transmit responses by e-mail to Graham Irby, Contract Specialist, at Graham.Irby@nrl.navy.mil in either Microsoft Office or .pdf format. All responses must be received on or before the time specified in the announcement.