Inactive

THIS SOURCES SOUGHT IS FOR INFORMATIONAL PURPOSES ONLY. THIS IS NOT A “REQUEST FOR PROPOSAL (RFP)”. THIS DOES NOT CONSTITUTE A SOLICITATION AND SHALL NOT BE CONSTRUED AS A COMMITMENT BY THE GOVERNMENT... THIS SOURCES SOUGHT IS FOR INFORMATIONAL PURPOSES ONLY. THIS IS NOT A “REQUEST FOR PROPOSAL (RFP)”. THIS DOES NOT CONSTITUTE A SOLICITATION AND SHALL NOT BE CONSTRUED AS A COMMITMENT BY THE GOVERNMENT. RESPONSES IN ANY FORM ARE NOT OFFERS AND THE GOVERNMENT IS UNDER NO OBLIGATION TO AWARD A CONTRACT AS A RESULT OF THIS ANNOUNCEMENT. NO FUNDS ARE AVAILABLE TO PAY FOR PREPARATION OF RESPONSES TO THIS ANNOUNCEMENT. ANY INFORMATION SUBMITTED BY RESPONDENTS TO THIS ANNOUCMENT IS STRICTLY VOLUNTARY. RESPONSES WILL NOT BE RETURNED TO THE RESPONDER. NOT RESPONDING TO THIS NOTICE DOES NOT PRECLUDE PARTICIPATION IN ANY FUTURE REQUEST FOR QUOTE (RFQ) OR INVITATION FOR BID (IFB) OR RFP, IF ANY ISSUED. IF A SOLICITATION IS RELEASED, IT WILL BE SYNOPSIZED ON THE GOVERNMENT-WIDE POINT OF ENTRY (GPE). IT IS THE RESPONSIBILITY OF POTENTIAL OFFERORS TO MONITOR THE GPE FOR ADDITIONAL INFORMMATION PERTAINING TO THIS REQUIREMENT. The Naval Research Laboratory (NRL) has a requirement for Molecular Beam Epitaxy (MBE) – Sputter Deposition – Angle Resolved Photoemission (ARPES) Ultra-High Vacuum Cluster Tool. See the attached draft specifications for full requirements. If your company has the system to fulfill this requirement, NRL requests your response to this announcement. At the minimum, please supply the following information: 1. COMPANY INFORMATION a. Name of company b. DUNS and CAGE CODE c. Point of contact for this response, to include telephone number and email address. d. Business size / Socio-economic status under NAICS 334516. Interested parties are required to indicate their small business type (i.e., Small Business, Small Disadvantaged Business, 8(a) Small Business Development Program, Historically Underutilized Business Zone (HuBZone), Veteran-Owned Small Business, Service-Disabled Veteran-Owned Small Business (SDVOSB), or Women Owned Small Business). 2. Information/documentation demonstrating how your system can meet the specifications for the Molecular Beam Epitaxy (MBE) – Sputter Deposition – Angle Resolved Photoemission (ARPES) Ultra-High Vacuum Cluster Tool. 3. Feedback regarding appropriateness of NAICS 334516 and PSC 6695 (Combination and Miscellaneous Instruments) for this requirement. 4. Any other feedback regarding the requirement/specifications. Please email your response to Zun Lin, Contract Specialist, at zun.lin@nrl.anvy.mil, no later than 3:00PM EST, 20 December 2019.