Inactive

This is a Notice of Proposed Contract Action under the FAR Part 12 Acquisition of Commercial Items and FAR Part 13 Simplified Acquisition Procedures. This notice is for information only; a solicitatio... This is a Notice of Proposed Contract Action under the FAR Part 12 Acquisition of Commercial Items and FAR Part 13 Simplified Acquisition Procedures. This notice is for information only; a solicitation will not be issued. THIS IS NOT A REQUEST FOR QUOTATION. No contract will be awarded on the basis of offers received in response to this notice. The associated North American Industry Classification System (NAICS) code is 334516 (Analytical Laboratory Instrument Manufacturing) with a small business size standard of 1000 employees. The Government requires the procurement of a Maskless UV Photo Lithography System. Maskless UV Photo Lithography System, Quantity: 1. The following components will be included in the purchase: 66SYS: DWL66+ system 66375: UV Diode Laser 66WMH: Write mode high resolution 66WM1: Write Mode I 66WM2: Write Mode II 66WM3: Write Mode III 66OAF: Optical Auto-focus 66VEC: Vector Exposure mode 66HAA: High accuracy coordinate system 66TF: Step-up Transformer 66WAR: Warranty extension The unique features of the Maskless UV Photo Lithography System that fulfill the Government’s needs are as follows: Compatible with a class 1000 cleanroom environment. The system has a UV (375nm wavelength) laser with output greater the 60mw to be compatible with the photo-resists intended for use by the Government. To create the structures required, this system is capable of creating "minimum feature size” 0.3um in its highest resolution mode and also has lower resolution settings that produce faster writing speeds. The system possesses a vector write mode (in addition to the standard raster-scanned mode) that allows for writing long lines without stitching boundaries. The system possesses cameras and software for automatic metrology and analysis of line-widths and edge roughness. The system is able to perform 2-layer exposures with alignment accuracy less than 400nm across 100 square mm area and able to adjust its coordinate system to match that of other tools. The system accepts DXF, GDSII and Gerber design files available to the Government. The system also accepts sample substrates up to 9 square inches in area and 12mm thick. The system possesses fully automatic alignment of samples and is compatible with window and linux operating systems. The Government intends to negotiate a sole source contract with Heidelberg Instruments, 2539 W. 237th St., Suite A, Torrance, CA 90505. The Government has determined that other companies’ products do not meet, or cannot be modified to meet its needs. This product is developed by Heidelberg Instruments and is not available through resellers. The unique features (cleanroom compatibility, substrate area, ability to support Gerber and DXF files, laser intensity and resolution requirements) of the Maskless UV Photo Lithography System by Heidelberg Instruments will only satisfy the Government’s requirement. This is a notice of proposed contract action and not a request for competitive proposals; however, all responsible sources may submit a capability statement or proposal, which shall be considered by the agency. All inquiries should be sent by email to leenawattie.budhu.1@us.af.mil. Responses must be submitted by the date/time listed on the notice. Any response to this notice must show clear and convincing evidence that competition would be advantageous to the Government in future procurements. Responses received will be evaluated; however a determination by the Government not to compete the proposed procurement based upon responses to this notice is solely within the discretion of the Government. The Government anticipates an award date on or before 30 June 2022. A Sole Source Justification will be attached to the subsequent Notice of Award in accordance with applicable regulation.