Inductively Coupled Plasma Cryo-Capable Reactive Ion Etcher for Etching Silicon and Dielectric Materials

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Notice ID:NIST-SS23-CHIPS-0016

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Department/Ind.Agency Subtier Office
COMMERCE, DEPARTMENT OF NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY DEPT OF COMMERCE NIST
NAICS 333242 - Semiconductor Machinery Manufacturing
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