Inactive

The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate, on a sole source basis, with Heidelbe... The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate, on a sole source basis, with Heidelberg Instruments, Inc., 2539 W. 237th Street – Suite A, Torrance, CA 90505 for the purchase of one (1) high-resolution laser mask writer and four (4) years of maintenance to be utilized by NIST’s Physical Measurements Laboratory (PML). The statutory authority for this acquisition is 41 USC 3304(a)(1); FAR 13.106-1(b). ***** Sole source determination is based on the need to acquire one (1) high-resolution laser mask writer and four (4) years of maintenance. The National Institute of Standards and Technology (NIST)/Center for Nanoscale Science and Technology (CNST) NanoFab seeks to acquire a high-resolution laser mask writer for the fabrication of photomasks and direct patterning of substrates for installation into the class 100 multi-user CNST NanoFab cleanroom facility. The mask writer instruments shall replace the existing, end of life DWL2000 mask writer, a technology that was introduced in 2013 which is heavily used to make masks in support of the existing contact aligners and projection stepper lithography tools. This system is intended to be used by NanoFab users to facilitate access to fast mask writing capability that provides patterning and alignment accuracy at submicron dimensions. Furthermore, this system will allow for repeatable lithographic processing of semiconductor substrates, thereby ensuring product performance, quality, and reliability. This capability will be available in the CNST NanoFab as a resource accessible to NIST and external researchers. Heidelberg Instruments is the only company that can deliver a mask writing system that can provide the following unique specifications: print features down to 500 nm, a critical dimension uniformity of less than 35 nm, an overlay between lithographic levels of less than 40 nm, features exhibiting line edge roughness of less than 25 nm, print speed of greater than or equal to 325 square millimeters per minute, and the ability to write an entire 6-inch by 6-inch 6025 SEMI-spec mask plate in less than or equal to 75 minutes. In addition to the above, Heidelberg Instruments is the only company that offers a high-resolution laser mask writer that supports the third party GenISys Beamer conversion of GDSII patterns to the mask writer format. At the CNST NanoFab, we have hundreds of internal and external users who are trained to use Beamer for data pattern preparation and conversion. Many users have developed customized Beamer process modules to optimally prepare and fracture data patterns. Losing the Beamer-integration capability will impede timely research progress of NIST mission critical projects. Heidelberg Instruments is the sole manufacturer and distributor of the equipment that meets the required minimum specifications. *****The North American Industry Classification System (NAICS) code for this acquisition is 334516 – Analytical Laboratory Instrument Manufacturing, with a small business size standard of 1,000 employees. *****A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement. *****No solicitation package will be issued. This notice of intent is not a request for quotations; however, all responsible sources interested may identify their interest and capability to respond to this requirement. Interested parties that believe they can satisfy the requirements listed above must identify their capability in writing before the response date of this notice. Only responses received by 11:59 p.m. Eastern Standard Time on February 9, 2023 will be considered by the government. Responses shall be submitted via email to tracy.bisson@nist.gov and angela.hitt@nist.gov. Contracting Office Address: 100 Bureau Drive Bldg. 301, Mail Stop 1640 Gaithersburg, Maryland 20899-0001