Atomic Layer Deposition (ALD) Batch Reactor
This is a sources sought notice for market research, not a solicitation, from NIST for one Atomic Layer Deposition (ALD) Batch Reactor to support semiconductor biosensor development. The reactor must handle 200 mm wafers, meet detailed technical specifications for hardware and software, and be delivered FOB Destination. Responses are due by 10:00 AM EST on July 14, 2026, with questions due by 12:00 PM EST on July 2, 2026. No budget amount is specified, and the location for performance is not mentioned. Interested parties must submit a capability statement addressing company details, business size, relevant experience, and whether the product is U.S.-manufactured.