Silicon and Silicon/Germanium Epitaxial Wafers
This opportunity involves the supply of wafers with a substrate diameter of 100 mm. The government does not specify a production method, allowing vendors to use CVD or MBE as long as specifications for thickness, composition, and coherency are met. For SiGe films, a composition tolerance of 5 atomic percent is required. No budget information or performance location is specified. No submission timelines are provided.