Inactive Total Small Business Set-Aside (FAR 19.5)

VAPHS Research has a need for a low-pressure plasma system capable of plasma cleaning, activation, etching, and coating through plasma ignition and generation driven by a high frequency generator. The... VAPHS Research has a need for a low-pressure plasma system capable of plasma cleaning, activation, etching, and coating through plasma ignition and generation driven by a high frequency generator. The equipment will be used primarily for its repeatable plasma ultra-cleaning process for Research’s instruments and supplies. The process is necessary to ensure specimen holders are free of foreign material prior to use in microscopes. VAPHS intends to purchase a Thierry Atto Low Pressure System Model 3 or equivalent. This is a Brand Name or Equal procurement.