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This Request for a Proposal specifies the design, manufacture, test, delivery, and installation of the Double Multilayer Monochromator (DMM) System. The DMM system is expected to operate 24/6 for ~ 5,... This Request for a Proposal specifies the design, manufacture, test, delivery, and installation of the Double Multilayer Monochromator (DMM) System. The DMM system is expected to operate 24/6 for ~ 5,000 hours per year. Scope includes: A stage for the up-reflecting multilayer (UML) with cooling system, multilayer mounting, a water-cooled mask, alignment motions, travel motions, and travel limits A stage for the down reflecting multilayer (DML) with cooling system, multilayer mounting, alignment motions, travel motions, and travel limits A monochromatic beam slit (MBS) assembly upstream of the DML. The blade faces are to be flat. Note: Slit mechanism must not conflict with the canted beam path for the 11-ID-B and 11-ID-C beamlines. 4 .One vacuum chamber containing the UML with feedthroughs, and additional ports for later add-ons 5. One vacuum chamber containing the DML with feedthroughs, larger port for quick access, one port downstream of the DML for a beam monitor, and additional ports for later add-ons The monochromatic beam scattered by the monochromator of 11-ID-C must pass through the chamber and exit the chamber through a window at its downstream end. The monochromatic beam scattered by the monochromator of 11-ID-B must pass outside of the chamber, clearing the chamber by at least 75 mm. 6. Two support structures for the vacuum chambers.